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Hiden HPR-30 Series Process Gas Analysers0 pages
HIDEN HPR-30 TECHNICAL SPECIFICATION
GAS ANALYSER
SYSTEM CONTROL
Mass Range
:
Ion Source
:
Mass Filter
:
Detector
:
Detection limit
(Triple Filter Option)
:
:
Filaments
:
Ion Source Control
:
Cables
Analyser Bakeout
:
:
200amu, 300amu,
510 amu.
Direct inlet high
pressure source.
200 amu, 300 amu Single Filter.
300 amu, 510 amu Triple Filter.
Faraday cup or dual
Faraday cup/
Channeltron electron
multiplier detector.
–12
5x10 Torr with Faraday
detector.
–14
2x10 Torr with
Channeltron detector.
Twin filament, Thoriated
Iridium as standard.
All parameters
adjustable in real time.
3m standard.
250°C.
Operating System :
Communication
:
Max. number
of sensors
Data Display
:
:
Input/Output
:
Gas Selection
:
Alarms
:
Vacuum Protection:
Windows 3.x / Windows 95
/ Windows NT.
RS232, RS422, RS485,
Ethernet LAN.
Limited only by resource of
user PC.
Simultaneous multi-head
display. Mixed mode
scanning - including multiwindow bar/profile/trend
display/leak detect. Integral
mass spectral library with
full edit facility.
Extensive analog/digital I/O
capability.
Point and click automatic
gas/mass select.
Extensive alarm options
including high-to-low/lowto-high status indication
with message send and
output drive capability.
Overpressure monitor for
filament protection.
HIDEN HPR-30 SERIES PRODUCT RANGE
Instrument
HAL 200 RC
HAL 201 RC
HAL 301 RC
HAL/3F RC 301
HAL/3F RC 501
Mass Range
Detector
Detection Limit
Order
Code
200
200
300
300
510
Faraday
Faraday/SCEM
Faraday/SCEM
Faraday/SCEM
Faraday/SCEM
1ppm
50ppb
50ppb
10ppb
10ppb
142100
143100
145100
553010
555010
SCEM = Single Channel Electron Multiplier
VACUUM SYSTEM AND ACCESSORIES
Order
Code
Component
UHV vacuum manifold with re-entrant orifice inlet (including 3 interchangeable orifices)
60l/s UHV turbomolecular pump set complete with two-stage rotary pump, controller, cables
and stainless steel foreline bellows
UHV Penning and Pirani gauge heads, controller and cables with pressure sensing setpoint
RGA manifold extension for UHV measurements
Fomblinised turbo and rotary pumps for reactive gas pumping applications
Combined turbo/drag pump with diaphragm foreline pump for hydrocarbon free pumping
Pneumatic valve option with automatic control module
Custom Go/No-Go status indicator panel
Bakeout heaters for UHV vacuum manifold
Statistical Process Control software with DDE from MASsoft
Mass spectral library with 62,250 spectra
Fully mobile cart with lockable castors
Hiden HPR-30 Series
Process Gas Analysers
High Performance Process Control
Gas Analysers for Vacuum, Plasma
and Thin Film Process Monitoring
303304
303702
303806
303314
303721
303731
303603
800520
303330
800260
800500
303713
OTHER HIDEN PRODUCTS FOR RESEARCH AND
DEVELOPMENT IN PLASMA PROCESSES
Complementing the range of HPR-30 systems for production control in thin
film processes Hiden manufacture state-of-the-art systems for fundamental
research in plasma applications:
TiN Dep.
HPR-30 System Dimensions (mm)
VACUUM SYSTEM
Vacuum Manifold :
Pumping
:
Gauges
:
Manifold Bakeout :
UHV vacuum manifold with isolation valve and re-entrant orifice inlet design. RGA
manifold extension for base line fingerprinting.
60l/s turbomolecular pump backed by two-stage rotary pump. Complete with pump
controller, automatic vent delay valve and vacuum protection interface.
UHV Penning and Pirani gauge heads with controller including pressure sensing
set-point and relay output for fail safe operation.
Manifold bakeout heaters to provide UHV operating environment.
• Hiden EQP
Plasma Sampling System
A high transmission and resolution ion energy analyser and quadrupole
mass spectrometer designed for detailed analysis of positive ions,
negative ions, neutrals and radicals in plasma.
:
Valve Control
Cables
Hardware cubicle
Display
Computer
Reference Library
Statistical Process
Control
:
:
:
:
:
:
:
Scan 2 : mass 32.00
Scan 3 : mass 44.00
Scan 4 : mass 40.00
Scan 5 : mass 2.00
Scan 6 : mass 18.00
• Hiden ESP
Electrostatic Plasma Probe
RF compensated Electrostatic Probe for routine, automatic analysis of
the primary parameters in RF and DC plasma.
Scan 7 : mass 15.00
Scan 8 : mass 14.00
Scan 9 : mass 20.00
Manufactured in England by:
HPR-30 SYSTEM OPTIONS
Pumping
Scan 1 : mass 28.00
Dry pumping for hydrocarbon free backgrounds. Corrosive/Reactive gas pumping
for aggressive environments.
Fully automatic valve operation and remote control.
Custom cable sets made to measure.
Mobile or free standing.
“Go/No-Go” status indicator panel for reagent and contaminant gases.
High specification PC compatible.
Mass spectral library complete with 62,250 spectra on CD-ROM.
SPC software package with DDE from MASsoft.
ANALYTICAL
HIDEN ANALYTICAL LTD
420 EUROPA BOULEVARD
WARRINGTON
WA5 7UN ENGLAND
Tel: +44 (0) 1925 445225
Fax: +44 (0) 1925 416518
E-mail: info@hiden.co.uk
Web: www.HidenAnalytical.com
Please note the specifications in this document may be changed and cannot form part of any contract.
TECHNICAL DATA SHEET 144
Certificate No. 6738
Printed in England
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