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EQP Mass and Energy Plasma Analyser0 pages
EXAMPLE EQP DATA
Hiden EQP Plasma Diagnostic Systems
Plasma etching of Hf-based high k thin films
The Hiden EQP System is an advanced plasma
diagnostic tool with combined high transmission ion
energy analyser and quadrupole mass spectrometer,
acquiring both mass spectra at specified ion energies
and ion energy distributions of selected plasma ions.
The advanced EQP ioniser provides for neutral and
radical detection, the electron attachment ionisation
feature further enhancing the detection capability for
radicals in electronegative plasma chemistries.
QMS-measured plasma ionic species are shown in
(a) and (b). Higher mass ionic species measured by
QMS are shown in (c) and (d). The data in the left
column are taken at 3 mTorr and 500W (high density
plasma condition) while those in the right column
are taken at 5 mTorr and 300W (low density plasma
condition).
Hiden EQP Systems High Sensitivity Mass and Energy Analysers for
Monitoring, Control and Characterisation of Ions,
Neutrals and Radicals in Plasma.
Data ref:
Ryan M. Martin, Jane P Chang
.
University of California, Los Angeles, USA.
J.Vac. Sci. Technol. A 27(2)
Positive Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 140 to 220 amu, showing SF6 , MoF5 and MoF6 Ions.
-
6000
10000
5000
SEM: c/s
7000
12000
-
8000
14000
8000
6000
3000
2000
2000
1000
500000
0
0
10
20
30
40
Cycle number 0000001
50
60
70
80
90
100
energy: V
• Mass Spectra at selected ion energies for
+ve ions, -ve ions and neutrals.
100000
90000
80000
70000
60000
50000
40000
30000
20000
10000
0
20
40
60
80
100
120
140
• Appearance potential spectra for identification of
radical species from parent stable molecules.
0
0
90
110
100
130
120
150
140
160
mass : amu
170
180
190
210
200
140
220
160
150
170
180
mass : amu
200
190
210
220
• Neutral and Radical Detection
The EQP integral electron impact ioniser provides
for analysis of neutral and radical species.
HIPIMS and conventional sputtering compared – mass and energy spectra
3
2
10M
10M
(b)
E = 0.5 eV
N2(1+)
100k
+
N2
10
Ar(1+)
10
0
5
10
Energy, (eV)
Certificate No. 6738
10k
Manufactured in England by:
Cr(1+)
1k
HIDEN ANALYTICAL LTD
10
420 EUROPA BOULEVARD
10
0
5
10
Energy, (eV)
WARRINGTON, WA5 7UN, ENGLAND
1
N
+
Tel: +44 (0)1925 445225
Fax: +44 (0)1925 416518
1+
Cr
+
N
2+
Cr
Cr
Email: info@hiden.co.uk
2+
0
0
0
10
20
30
40
50
60
0
10
20
mass : amu
30
40
50
60
Web Site: www.HidenAnalytical.com
mass : amu
It is Hiden Analytical’s policy to continually improve product performance and therefore specifications are subject to change.
Mass and energy spectra of (a) HIPIMS of Cr and (b) conventional dc sputtering of Cr in Ar and N2
atmosphere as used to deposit the CrN/NbN nanolayer coating.
Data ref: Purandare, Ehiasarian and Hovsepian. J.Vac. Sci Technol. A 26(2).
TECHNICAL DATA SHEET 172
plasma diagnostics
N2(1+)
Flux, (x10 6 counts -1)
2
+
N2
gas analysis
10k
1k
+
Ar
1+
Cr
surface science
Ar
Countrate, cs -1
+
Cr(1+)
100k
Countrate, cs -1
E = 0.5 eV
1M
1M
1
Ar(1+)
vacuum analysis
(a)
Flux, (x10 6 counts -1)
2e+06
1.5e+06
0
• Positive and Negative Ion Measurement
Pre-set software modes enable automatic switching
between positive ion, negative ion and neutral
analysis modes.
4000
4000
2.5e+06
• Electron Attachment Ionisation
This technique of soft ionisation offered as an
option for the analysis of electronegative species in
plasma, further enhances the analysis of neutrals
and radicals.
• Appearance Potential Spectra
The EQP ioniser features precision control of all ion
source parameters, including the facility to
accurately scan electron energy for appearance
potential spectra of selected species. The
appearance potential spectra provide direct
information to confirm the fragmentation and
excitation state of plasma neutral species.
5 lpm CO2, Plasma Reactor: 1 Torr Appearance Potential: mass 32
10000
9000
400 W plasma
metastable O2
excited state a1∆g
8000
SEM: c/s
SEM: c/s
16000
-
Ar+ IED
Inductively Coupled
Plasma Source
25mT 100W
3e+06
• Afterglow, Pulsed Plasma, and Laser Ablation
A standard TTL signal gating input is included for
time resolved studies.
The programmable signal gating option provides
for automatic data acquisition for defined time
slices through the plasma pulse. Gating resolution
is 100 nanoseconds.
Negative Ions. Molybdenum Cathode. Sulphur Hexafluoride Gas.
Mass spectrum 90 to 220 amu, showing Molybdenum Fluoride Ions.
3.5e+06
1e+06
• High Sensitivity
Sub PPM detection of plasma ions, neutrals and
radicals.
• Ion Energy Analysis
Ion Energy distributions of plasma ions are
acquired in seconds, 100 eV and 1000 eV energy
range versions are available.
Magnetron sputtering – Positive and negative ion mass spectra
• Ion Energy Distributions of selected +ve
and -ve ions.
SEM: c/s
5 mTorr, 300Watt
SEM: c/s
3 mTorr, 500Watt
EQP Operating Modes
7000
6000
5000
4000
no plasma
ground state O 2X 3 Σ -g
3000
2000
1000
0
10
10.5
11
11.5
12
12.5
13
electron-energy: V
13.5
14
14.5
15
• Electron attachment ionisation scans to identify
radical species produced in the plasma from
electronegative gases.
CF 4- Ions By Attachment in CF 4
"
