LITHOGUARD®0 pages

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gl Donaldson.

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ÏSM FILTRATION SOLUTIONS

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LITHOGUARD -12

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CHEMICAL CONTAMINATION CONTROL

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Semiconductor Filtration

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The LITHOGUARD®-12 cabinet and its associated

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chemical filter is a high efficiency filtration system that

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removes gas-phase contaminants such as volatile bases,

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acid gases, condensable organics, as well as particles.

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Designed for high end lithography tools, including

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248 nm, 193 nm "dry" and 193 nm immersion exposure

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tools, it provides an ultra-clean environment that

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enables critical chemical processes and prevents the

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degradation and contamination of optical elements.

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FEATURES & BENEFITS

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• Small footprint

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• High efficiency filtration (each individual filter

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achieving 99%+ removal efficiency)

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• Serial filtration that enables air sampling between

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the filters

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• Low cost of ownership due to:

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• Long filter life

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• Donaldson Refill Program

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• HEPA Particulate filtration > 99.97% efficiency

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• No facility requirements. No connection to CDA

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or compressed N2 required.

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UTHOGUARD-12

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SPECIFICATIONS

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Supply Utility Requirements

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• The LITHOGUARD-12 requires: • No electrical supply required

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• 12 - Donaldson BSMmax chemical filters AND • No compressed air supply required

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• 6 - Donaldson HEPA particulate filters

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Airflow

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• Real-time air sampling via integrated sampling ports allows for continuous

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performance management.

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• Using the latest airflow modeling technology, the LITHOGUARD-12 was designed to:

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• Utilize a small footprint

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• Optimize filtration performance

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• Ensure even distribution of airflow through each filter element

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• Maximize system efficiency and life

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