IG3 ion source package0 pages

rbd
instruments

3 kV backfill ion source and control
IG3 ion source package

innovations for
surface science

description

RBD Instruments’ IG3 Ion Source Package is the enhanced version of our IG2 package.
Increasing the beam voltage from a maximum of 2 kV to 3 kV results in higher sputter
etch rates.
The Model 04-165-3 kV Backfill Ion Source generates an energetic inert gas ion beam
for sputter-etching solid surfaces. The source requires a static pressure of 5x10-5 Torr
with an inert gas such as argon. Ions are generated by electron impact within the ion
source’s dual filament ionization chamber and are then focused at the target with
energies of up to 3 kV. The impurity content of the ion beam is minimized by using
an off-axis filament geometry. A focusing lens permits high ion current density to
be obtained for a given operating pressure and source-to-sample distance. A dual
tungsten filament assembly permits continued operation when the first filament
opens. The expected lifetime of the filament assembly is several years under normal
usage at the recommended operating conditions. The filament assembly is easily
replaced in the field.
The Model 32-165-3 kV Ion Source Control provides all the necessary voltages and
currents required to operate the Model 04-165-3 kV Backfill Ion Source. The beam
voltage may be activated manually, remotely, or with the built-in timer. Additionally,
the anode (ion) and filament currents, as well as the beam and focus voltages, may be
externally monitored to ensure accurate reproduction of sputtering conditions.

benefits

04-165-3 (3 kV):
●● “Cleaner” Ion Beam: Uses an off-axis filament geometry to minimize impurities.
●● Longer Use: Expect several years of use from the filament assembly. Additionally,
there are two filaments: If one opens, simply use the filament switch to select the
second filament so that the 04-165-3 continues to work without breaking vacuum.
●● Easy to maintain: The filament assembly is easily replaced in the field.
32-165-3 (3 kV):
●● Multiple Ways to Sputter: Activate the beam voltage manually, remotely, or with
the built-in timer.
●● t eplicate Your Sputtering Conditions: The anode meter lets you set the target
R
current without the use of a picoammeter, even on grounded targets.
Externally monitor the ion and filament currents as well as the beam and focus
voltages.