pimfc-LDds0 pages
W W W . M K S I N S T . C O M
Flow Measurement
& Control
πMFC – Low Pressure
MASS FLOW CONTROLLER
FOR ION IMPLANT APPLICATIONS
The PFC-20, Low Pressure πMFC mass flow controller provides maximum utilization of
Safe Delivery Source gases. Implementation of the Low Pressure πMFC increases tool
uptime by reducing the frequency of source gas cylinder changes. It offers accurate and
precise control of low gas flows over a wide pressure range with source gas delivery
pressure as low as 4 Torr.
This πMFC is the latest in MKS products designed specifically for SDS and VAC® source
gases serving the ion implantation industry. The patented valve and sensor designs offer
exceptional zero stability and accuracy for all flow conditions while maintaining the ability
to rapidly achieve setpoint and repeatably control the gas flow. Standard-sized MFC
footprint and control I/O are compatible with existing gas lines for easy integration and
operation.
Features & Benefits
•t Maximizes SDS source gas utilization t
t reducing bottle changes resulting in t
t higher tool uptime and lower cost-of-t
townership
•t Repeatedly controls low gas flows t
t allowing for reduced gas consumption t
t using parameters optimized for tt
t implanter source applications
•t Digital control loop provides rapid t
t response to setpoint minimizing process t
t cycle time
•t Increases tool uptime through reduction t
t of “No Problem Found”: MFC tt
treplacements
t —t ncluded embedded diagnostics and t
I
tt software allowing users to check MFC t
tt functionality without removing the t
ttMFC
t —E-diagnostics through embedded t
tt Ethernet interface allows monitoring t
tt performance parameters during t
ttoperation
•t Direct form-fit-function replacement for t t
tmost common MFCs
•t Reduces inventory costs through multi-t t
t gas, multi-range capability
•t Straightforward configuration and t
t
t diagnostics through Ethernet interface
t —t ses standard web browser – no tt
U
t special software required
t —t ncludes remote PC application
I
•t Bright rotatable LED display provides t
t
t easy viewing of flow rate, gas type, full tt
t scale flow range, temperature and tt
t Ethernet address
Protected under one or more of the following
U.S. patents: No. 6,668,641, No. 6,668,642, No.
6,779,394, No. 6,868,862, No. 6,810,308, No.
7,004,191 or International Patents and Patents
pending.