High Purity Products0 pages

Positioned For The Next
Challenge In Ultra-Pure Filtration
Mott provides all-metal filters for
semiconductor processes, as well as
state-of-the-art diffusers and innovative
flow restrictor products. We offer the
widest selection of all-metal filters for
high purity applications. Alloy choices
include 316L stainless steel, nickel and
Hastelloy® C-22 construction to ensure
chemical compatibility. Mott offers a
full suite of products and is offers
custom design expertise to ensure
the optimal solution for your
semiconductor process.

Product Offering
In-Line Point-of-Use Filters (POU) – GasShield®
POU filters are available in over 20 standard
designs and rated for flows up to 600 slpm
and inlet pressure as high as 5000 psig.
IGS Filters – Mott offers a full line of filter and flow
restrictor products in designs compatible with
the gas system interfaces in process tools, gas
cabinets, and valve manifold box installations.
Range of flow rates is 10 to 100 liters per minute.
GasShield® PENTA® POU Filters – For high flow
applications, Mott PENTA filters are constructed
from our unique high-flow nickel media that
combines true 9-log filtration with a high flow
and low ΔP.
Utility Line Filters – Mott utility line filters provide
a high-strength, all-metal solution to filtration
requirements inside the wafer fab where flows
are typically below 1500 liters per minute.

Bulk Filters – These filters are designed to
accommodate flows from 1000 slpm to 25,000
slpm with 316L stainless steel or nickel filter
elements. Additional bulk designs are available for
applications involving higher pressures or highly
corrosive gases.
Gasket Filters – This compact filter design fits
inside a ¼" face seal fitting and does not add
length to the gas system. Standard rated flows
are 1, 3, and 20 slpm.
Flow Restrictors – Porous metal permanently
affixed to standard fittings for reliable, affordable
flow control, without the drawbacks of mass flow
controllers, needle valves and calibrated orifices.
Downstream flows range from 100 slpm to
<1 x 10-6 sccm.
Gas Diffusers – Mott diffusers evenly disperses
purge gas to ensure a uniform and laminar flow
of gas, eliminating turbulent disturbance of any
particles in the EFEM, load lock, wafer transfer or
process chamber.