AP-300 Plasma System0 pages

AP-300 Plasma System
Features and Benefits

Touch screen control and graphical user
interface give real-time process
information
Flexible shelf architecture allows
processing of a wide variety of piece parts,
components or carriers
13.56 MHz RF generator with automatic
matching network delivers excellent
process repeatability
Convenient facility hook-ups for periodic
calibration requirements used in validation
processes

State-of-the-art plasma treatment in a
compact, bench-top configuration

Plasma cleaning, surface activation and
adhesion improvement

The AP-300 system from Nordson MARCH is designed to
deliver exceptionally uniform plasma cleaning and
treatment with unmatched ease of operation, reliability and
low cost.

The AP-300 system is suitable for a wide variety of plasma
cleaning, surface activation and adhesion improvement
applications. These capabilities are used for semiconductor
manufacturing, microelectronic packaging and assembly,
and by manufacturers of medical and life science devices.

The AP-300 system is completely self-contained, requiring
minimal bench space. The system chassis houses the
plasma chamber, control electronics, 13.56 MHz RF
generator, and the automatic matching network (only the
vacuum pump is external to the system). Maintenance
access is provided through an interlocked door or
removable panels.
The plasma chamber is constructed of high-quality
aluminum with aluminum fixtures for superior durability.
The plasma chamber supports up to 7 removable and
adjustable powered or grounded shelves to accommodate a
wide range of piece-parts, components, and part carriers
including magazines, trays, and boats.

The AP-300 system can accommodate a wide range of
process gases including argon, oxygen, hydrogen, helium,
and fluorinated gases. The system comes standard with
two electronic mass flow controllers for optimal gas
control, with another two available optionally (four total
max.).