RF sensor sell0 pages
INFICON RF Sensor system configuration
INFICON RF Sensor
With FabGuard® Integration Software
REAL-TIME PLASMA ANALYSIS
SIGNIFICANTLY REDUCES
PROCESS VARIABILITY
Combined with FabGuard Sensor Integration and
Analysis System, the INFICON RF Sensor brings you
an unprecedented, highly detailed look into semiconductor plasma processing. Based on our worldwide depth
of application experience, this advanced technology
provides the first truly integrated solution for RF load
measurement in the process chamber’s non-50 ohm
environment. It enables superior, real-time process
control, fault detection/classification and process
optimization for the most challenging plasma environments—all via a user-friendly interface.
BETTER TECHNOLOGY DELIVERS MORE
PROCESS CONTROL CAPABILITIES
In plasma processing, the true RF load includes
both chamber and plasma discharge. Chamber
wall, wafer and discharge chemistries affect this
load’s complex impedance.
Plasmas are non-linear, which results in RF
harmonics production. Varying machine or process
setpoints generate unique harmonic content in
the RF voltage and current. By monitoring the
harmonic voltages and currents, as well as the
complex impedance of the load, the INFICON RF
Sensor with FabGuard offers powerful process
control capabilities.
A P P L I C AT I O N S F O R C V D ,
P V D A N D E TC H I N C LU D E :
■
Endpoint/optimization of in-situ plasma
chamber clean processes
■
Fault detection and classification
(e.g., arc detection, charging)
■
Chamber matching (RF fingerprint)
■
Endpoint control for etch processes
Plasma arcing event captured by an RF sensor.
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