ماشین آلات پوشش دهی CVD
Vacuum PE-CVD deposition machine: NANO-MASTER, Inc. PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 8” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source with Fractal Gas Distribution. The platen can be biased with RF or Pulsed DC and it is heated resistively or cooled with chilled water circulation.
MOCVD deposition machine / thin-film:Nano-Master, Inc. has developed the first Table Top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for InGaN and AlGaN deposition processes. The features include five bubblers with individual cooling baths, heated gas lines, 950 °C platen, three gas rings, RF plasma source with Shower Head Gas Distribution and N2 flush at the end of the process, 5 10-7 Torr base pressure, 250 l/sec turbo pump with oil-free scroll pump, PC controlled, fully automated and safety interlocked.
Vacuum PE-CVD deposition machine: PentaBlue is a PECVD (Plasma Enhanced Chemical Vapour Deposition) coating system where the wafers are coated with an antireflection layer consisting of silicon nitride. This technology uses a direct plasma reactor which achieves improved cell efficiency and higher density of Si-nitrate layer in comparison to the remote plasma reactor.
MOCVD deposition machine / thin-film:Industry's Highest Productivity, Highest Footprint Efficiency Platform for LED Manufacturing
TurboDisc® MaxBright® M™ GaN MOCVD Multi-Reactor System platform is the industrys highest footprint efficiency MOCVD system designed to manufacture high quality, high brightness light emitting diodes (LEDs). MaxBright M provides up to 15% improved footprint efficiency, easier serviceability and offers accommodating layout configurations compared to the original MaxBright. The MaxBright M leverages Veecos production-proven Uniform FlowFlange® technology and automation expertise by combining multiple high throughput MOCVD reactors in a modular 2- or 4-reactor cluster architecture.